Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine

Product Details
After-sales Service: 1 Year
Demoulding: Automatic
Condition: New
Diamond Member Since 2017

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1000000 RMB
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
  • Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
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Basic Info.

Model NO.
MDXN-25D
Certification
CE
Warranty
12 Months
Automatic Grade
Semiautomatic
Installation
Vertical
Driven Type
Electric
Mould Life
>1,000,000 Shots
Transport Package
Wooden Crate
Specification
200kg
Trademark
minder-hightech
Origin
China
Production Capacity
1000

Product Description

Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography MachineSemiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography MachineSemiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine
MDXN-25D Mask aligner

Purpose and characteristics:
This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithography machines in various colleges and research institutions.It is mainly used for the development and production of small and medium-sized integrated     circuits,semiconductor components,optoelectronic devices,and surface acoustic wave devices.
On the premise of maintaining the original main technical indicators of the equipment, we have optimized some structures and components of the equipment, reduced some unnecessary mechanical actions, and ensured that the failure points of the equipment are minimized as much as possible, and the operation of the equipment is also very stable and reliable.
Semiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography MachineSemiconductor Industry Machine Mdxn-25D Mask Aligner / Lithography Machine

Main technical parameters
1.Exposure type: single sided.
2.Exposure area:110×110mm.
3.Uneven exposure illumination: ≤±3%.
4.Exposure intensity:0-30mw/cm2 adjustable.
5.UV beam angle: ≤3°.
6.Central wavelength of ultraviolet light:365nm.
7.UV light source lifespan: ≥500 hours.
8.Adopting electronic shutter.
9.Exposure resolution:1 μm;
10.Microscopic scanning range:X:±15mm   Y:±15mm;
11.Alignment  range:X,Y     adjustment±4mm;Q-direction    adjustment±3°;
12.Engraving accuracy:1 μ The accuracy of the user's "version"and "chip"must comply with national regulations,
and the environment,temperature,humidity,and dust can be strictly controlled.Imported positive photoresist is used,and the thickness of the uniform photoresist can be strictly controlled.In addition,the front and rear  processes are advanced;
13.Separation amount;0~50  μm adjustable;
14.Exposure method:close exposure,which can achieve hard contact,soft contact,and micro force contact exposure; 15.Square  finding  formula:air
 

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