Rtp Equipment Rapid Thermal Processing for Compound Semiconductor SLC LED Mems

• After-sales Service: 1 Year
• Warranty: 1 Year
• Type: Electrical Etching Machine
• Object: Wafer
• Usage: Rie
• Certification: CE
• Etching Type: Double Spray
• Precision: High Precision
• Condition: New
• Weight (Kg): 1000
• Showroom Location: None
• Video Outgoing-Inspection: Provided
• Machinery Test Report: Provided
• Marketing Type: New Product 2024
• Warranty of Core Components: 1 Year
• Core Components: PLC
• Place of Origin: Guangdong, China
• Selling Units: Single Item
• Single Package Size: 150X150X120 Cm
• Single Gross Weight: 1000.000 Kg
• Transport Package: Minder-Hightech
• Trademark: minder-hightech
• Origin: China

Product Description

Product Description

RTP SYSTEM
Rapid Thermal Processing
Provide reliable RTP equipment for compound semiconductors,SlC,LED and MEMS

Industry applications

1. Oxide, nitride growth
2. Ohmic contact rapid alloy
3. Annealing of silicide alloy
4. Oxidation reflux
5. Gallium arsenide process
6. Other rapid heat treatment processes

Fully automatic dual chamber RTP
Feature

1. Compatible with 6-8inch WAFER
2. The maximum temperature can reach 1250°c
3. Stable temperature reproducibility
4. Fully automatic dual chamber design to increase production capacity
5. Uniformity of ultra-high temperature field
6. Meet the demand for SlC mass production process

Semi-automatic RTP
Feature

1. Infrared halogen lamp tube heating, cooling using air cooling;
2. PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
3. The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
4. Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
5. Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
6. The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
7. The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument;

Desktop RTP
Feature:

1. Infrared halogen lamp tube heating, cooling using air cooling;
2. PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
3. The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
4. Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
5. Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
6. The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
7. The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument.

Detailed Photos