Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic

Product Details
After-sales Service: Installation, Training
Warranty: One Year Warranty
Type: Electrical Etching Machine
Diamond Member Since 2017

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  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
  • Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
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  • Product Description
Overview

Basic Info.

Model NO.
MD150-SICP
Object
Silicon-Based:Si/Sio2/Sinxsic
Usage
Corrosion & Hollowed-out
Certification
ISO9001: 2000, CE
Etching Type
Reactive Ion Etching
Precision
High Precision
Condition
New
Transport Package
Wooden Case
Specification
1170*750*1080mm
Trademark
Minder-Hightech
Origin
China
Production Capacity
10set/Month

Product Description

Product Description

 

Inductively coupled plasma etching machine-ICP
Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
Item MD150S-ICP MD200S-ICP MD150CS-ICP MD200CS-ICP MD300C-ICP
Product size ≤6 inches ≤8 inches ≤6 inches ≤8 inches Custom≥12inches
SRF Power source 0~1000W/2000W/3000W/5000WAdjustable,automatic matching\,13.56MHz/27MHz
BRF Power source 0~300W/0~500W/0~1000WAdjustable, automatic matching,2MHz/13.56MHz
Molecular pump Non corrosive : 600 /1300 (L/s)/Custom Anti-corrosion:600 /1300 (L./s)/Custom 600/1300(L/s) /Custom
Foreline pump Mechanical pump / dry pump Anti corrosion dry pump Mechanical pump / dry pump
Pre pumping pump Mechanical pump / dry pump Mechanical pump / dry pump
Process pressure Uncontrolled pressure/0-0.1/1/10Torr controlled pressure
Gas type H2/CH4/O2/N2/Ar/SF6/CF4/
CHF3/C4F8/NF3/NH3/C2F6/Custom
(Up to 12 channels, no corrosive & toxic gas)
H2/CH4/O2/N2/Ar/SF6/CF4/CHF3/ C4F8/NF3/NH3/C2F6/Cl2/BCl3/HBr/
Custom(Up to 12 channels)
Gas range 0~5sccm/50sccm/100sccm/200sccm/300sccm/500sccm/1000sccm/Custom
LoadLock Yes/No Yes
Sample tem control 10°C~Roomtem/ -30°C~150°C /Custom -30°C~200°C/Custom
Back helium cooling Yes/No Yes
Process cavity lining Yes/No Yes
Cavity wall tem control No/Room tem-60/120°C Room tem~60/120°C
Control System Auto/custom
Etching material Silicon-base: Si/SiO2/
SiNx/ SiC.....
Organic materials:PR/Organic
film......
Silicon-base: Si/SiO2/SiNx/SiC
III-V: InP/GaAs/GaN......
IV-IV: SiC
II-VI: CdTe......
Magnetic material / alloy material
Metallic materials: Ni/Cr/Al/Cu/Au...
Organic materials: PR/Organic film......
Silicon deep etching
Process result
Quartz / silicon / grating etching
Using BR mask to etch quartz or silicon materials, the grating array pattern has the thinnest line up to 300nm and the sidewall steepness of the pattern is close to > 89° , which can be applied to 3D display, micro optical devices, optoelectronic communication, etc

Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
Compound / semiconductor etching
Accurate control of sample surface temperature can well control the etching morphology of GaN based, GaAs, InP and metal materials. lt is suitable for blue lED devices, lasers, optical communication and other applications.

Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic
Silicon-based material etching
it is suitable for etching silicon based materials such as Si, SiO2, and SiNx. lt can realize silicon line etching above 50nm and silicon deep hole etching below 100um

Inductively Coupled Plasma Etching Machine-Icp for Si/Sio2/Sinx/ Sic



 

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