Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying

  • Audited Supplier
  • 10 yrs

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Product Highlights

  • Wide Wafer Size Compatibility: Applicable to 2-12-inch production lines for silicon wafers and other materials.
  • Low Fragment Rate: Achieves a fragment rate of 1/10000 through precise dynamic balance verification.
  • Intelligent PLC Control: Adopts PLC intelligent control for reliable operation and program management.
  • Vacuum Operation: Operates under vacuum conditions with inactive gas as the drying medium.
  • Corrosion Resistant Materials: Main components made of SUS304 stainless steel with PTFE air control valves.
  • Multi-Station Configuration: Available in 2, 4, or 6 stations to handle various wet process requirements.
  • Stable and Reliable: Features low vibration design and continuous operational method for stability.
  • Fast Temperature Rise: Electric heating system ensures fast temperature rise and stable control.

Product Images of Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying

Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying pictures & photos
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying pictures & photos
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying pictures & photos
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying pictures & photos
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying pictures & photos
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
  • Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
    Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
  • Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
    Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
  • Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
    Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
  • Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
    Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
  • Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
    Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying

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Product Description

Product Description

 

MDSD wafer dryer

Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer DryingMDSD wafer dryer
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer DryingSrd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer DryingSrd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying
 Features
* Reasonable structure design and mature technology
*Simple operation, convenient maintenance, stable and reliable operation of the whole machine
* Low vibration, good reliability and large output
technical parameter
*Wafer size: applicable to 2-12-inch production line
*Fragment rate: 1/10000
application area
SPM acid cleaning, organic cleaning, development, degumming, ITO etching, BOE etching, uniform glue and other process wafer drying
Equipment function
The equipment is divided into 2 stations, 4 stations and 6 stations, which can clean 2-12-inch silicon wafers, potassium nitride, gallium arsenide, sapphire, semiconductor, LED, solar energy and other wet processes, including cleaning, drying, nitrogen drying and working chamber drying.
process parameters
process parameters time speed
Flushing (Type B) 0-999s 0-800r/min
Purging (type B) 0-999s 0-800r/min
Drying I (type B) 0-999s 0-800r/min
Drying II (type B) 0-999s 0-800r/min
Factory conditions
Voltage Single-cavity power Nitrogen pressure Nitrogen flow Pure water pressure Pure water flow Nitrogen interface Pure water interface Drainage caliber outlet diameter
AC380V/50Hz 5KW 0.25-0.4MPa 180-250L/min 0.2-0.3MPa 7-12L/L/min 3/8 3/8 DN32 DN110
Features
* Adopt PLC intelligent control to make all operation reliable and program intelligent.
* Adopt frequency conversion motor belt drive, low maintenance.
* Rotary shaft nitrogen seal, labyrinth design, to ensure that the chamber is isolated from the external environment during equipment operation.
* PTFE air control valve, clean pipe fittings.
* The main components are made of high-quality stainless steel SUS304. The internal frame is made of national standard stainless steel square steel, which is corrosion resistant and corrosion resistant. The appearance design is novel, humanized and easy to operate.
* The rotating mechanism is verified by precise dynamic balance, and the main frame is of load-bearing structure, which ensures the balance and stability of the system during operation, reduces the generation of vibration sources and greatly reduces the fragmentation rate.
* The top of the cover adopts imported silica gel heating auxiliary system, which is dry without dripping after drying.
* Electric heating system is adopted, with fast temperature rise, easy control and stable temperature.
Srd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer DryingSrd Wafer Dryer Spm Acid Cleaning, Organic Cleaning, Developing, Degumming Process Wafer Drying

About the Supplier

This supplier has been audited by SGS. Verify the report on the official SGS website with ID "QIP-ASR2311045". Items marked "verified" are certified.

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Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd
Guangzhou Minder-Hightech co.,Ltd

About Our Factory & Business Background

Address
Room 813, No. 43, Xinshuikeng Section, Shixin Road, Dalong Street, Panyu District, Guangzhou, Guangdong, China
verified Registered Capital
1,000,000 RMB
verified Terms of Payment
T/T
verified International Commercial Terms(Incoterms)
EXW
verified Average Lead Time
Peak Season Lead Time: one month
Off Season Lead Time: one month
verified Nearest Port
Shenzhen Port

Our Production Capability & Technical Expertise

Main Products
Wire Bonder, Soldering Machine, Bond Tester, Grinder and Polisher, Dicing Saw, Die Bonder, Plasma Surface Treatment Machine, Ultrasonic Metal Welder, Glue Dispenser, Parallel Sealing Welder
verified R&D Engineers
1 people

Our Industry Experience & Global Business Record

verified Year of Establishment
2014-12-30
Export Year
2014-12-31
verified Main Markets
North America, Europe
verified Overseas Agent/Branch
No

FAQ

What wafer sizes are supported?
The dryer is applicable to 2-12-inch production lines.
What is the warranty period?
We provide a 1-year warranty and after-sales service.
What materials can be processed?
It processes silicon wafers, potassium nitride, gallium arsenide, sapphire, semiconductor, LED, and solar energy materials.
What is the maximum fragment rate?
The equipment achieves a low fragment rate of 1/10000.
How many stations are available?
The equipment is divided into 2, 4, and 6 stations.
What is the lead time?
The average lead time is one month for both peak and off-peak seasons.
What is the payment term?
The accepted payment term is T/T.
What is the operation pressure?
The equipment operates under vacuum pressure.

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