Product Description
RTP SYSTEM
Rapid Thermal Processing
Provide reliable RTP equipment for compound semiconductors,SlC,LED and MEMS
Industry applications
- Oxide, nitride growth
- Ohmic contact rapid alloy
- Annealing of silicide alloy
- Oxidation reflux
- Gallium arsenide process
- Other rapid heat treatment processes
Fully automatic dual chamber RTP
Feature
- Compatible with 6-8inch WAFER
- The maximum temperature can reach 1250°c
- Stable temperature reproducibility
- Fully automatic dual chamber design to increase production capacity
- Uniformity of ultra-high temperature field
- Meet the demand for SlC mass production process
Semi-automatic RTP
Feature
- Infrared halogen lamp tube heating, cooling using air cooling;
- PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
- The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
- Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
- Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
- The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
- The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument;
Desktop RTP
Feature:
- Infrared halogen lamp tube heating, cooling using air cooling;
- PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
- The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
- Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
- Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
- The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
- The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument.
Detailed Photos
Minder-Hightech is sales and service representative in semiconductor and electronic product industry equipment.
The company is committed to providing customers with Superior, Reliable, and One-Stop Solutions for machinary equipment.
1. About Price:
All of our prices are competitive and negotiable. The price varies depending on the configuration and customization complexity of your device.
2. About Sample:
We can provide sample production services for you, but you may provide some fees.
3. About Payment:
After the plan is confirmed, you need to pay us a deposit first, and the factory will start preparing the goods. After the equipment is ready and you pay the balance, we will ship it.
4. About Delivery:
After the equipment manufacturing is completed, we will send you the acceptance video, and you can also come to the site to inspect the equipment.
5. Installation and Debugging:
After the equipment arrives at your factory, we can dispatch engineers to install and debug the equipment. We will provide you with a separate quotation for this service fee.
6. About Warranty:
Our equipment has a 12-month warranty period. After the warranty period, if any parts are damaged and need to be replaced, we will only charge the cost price.
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