• Pyriform Double Chamber Sputtering System for Metal Film&Semiconductor Film
  • Pyriform Double Chamber Sputtering System for Metal Film&Semiconductor Film

Pyriform Double Chamber Sputtering System for Metal Film&Semiconductor Film

After-sales Service: Installation, Training
Warranty: 1 Year
Type: Coating Production Line
Coating: Vacuum Coating
Substrate: Steel
Certification: CE, ISO, RoHS, REACH
Diamond Member Since 2017

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Basic Info.

Model NO.
MDJGP-560
Condition
New
Transport Package
Wooden Case
Specification
2600× 900mm2
Trademark
Minder-Hightech
Origin
China
Production Capacity
100set/Month

Product Description

MDJGP-560 Pyriform Double Chamber Sputtering System
Pyriform Double Chamber Sputtering System for Metal Film&Semiconductor Film
Product Introduction
Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions.

Structure
Sputtering vacuum chamber, magnetron sputtering target, water-cooling substrate heating turntable, sample injection chamber, sample chamber, annealer, backwash target, magnet sample send mechanism, gas circuit, pumping system, vacuum measurement system, electrical control system and mounting base

Pyriform Double Chamber Sputtering System for Metal Film&Semiconductor FilmPyriform Double Chamber Sputtering System for Metal Film&Semiconductor FilmPyriform Double Chamber Sputtering System for Metal Film&Semiconductor Film

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