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Audited Supplier We supplies / offers a High Vacuum Magnetron Ion Sputtering Coater (DC / RF Model) that is ideal and designed for materials science and sample preparation. It is widely used for the majority of universities and scientific research institutes of materials science and engineering to coat, for metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation.
High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It provides DC / RF two kinds of sputtering power options which allow sputtering conductive or non-conductive substance on specimen and improves physical vapor deposition (PVD) Performance. It is also excellent for surface treatment and coating. It is easy to operate and user friendly as well.
Vacuum pump and Chiller are included.
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Technical Specifications |
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Vacuum Pump Set |
(Oil required)Rotary Vacuum Pump +(Oil free) Turbo MolecularPump set |
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Rotary Pumping Speed |
50 Hz:16m3/h (4.4 L/s) / 60 Hz∶19.2m3/h (5.2 L/s) |
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Molecular Pumping Speed |
300 L/S |
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Vacuum Limit |
5*105Pa |
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Working Pressure |
0.5- 5 Pa |
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Vacuuming Time |
> 10 Min (10-3Pa) |
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Vacuum Measure |
Measuring range from atmosphere to 10-6Pa |
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Gas Control |
Gas Flow Controller |
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Chamber Size |
φ260*200mm (height) Metal |
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Magnetron Target Source |
Target size φ50 *3mm (Cu)l Target source: Weak Magnetic Substance / Materials |
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Operation Method |
Instruction Manual |
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Weight / Size |
100kg / 610mm length x 420mm wide x 490mm high |
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Power Supply |
AC 110V 60Hz or AC 220V 50Hz |
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Power Consumption |
<300ow |
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Cooling Method |
Air Cooling (Pump) + Water Cooling ( Sputtering Target ) |
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Warranty |
One year limited warranty with lifetime product support |
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Audited Supplier 
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